SEMICON Taiwan 2015        Please click here to register

2015 CMP Forum Taiwan


 

Date: Friday, September 4th, 2015

Time: 08:15-12:00 (08:15 - 08:35 for registration)

Venue: Room 402c, Taipei Nangang Exhibition Center, Hall 1

 

Theme:

Ensure the foundation and source Uphold the middle

 

Forum Outline:

Whether more and Moore, or more than Moore, substrate choice, effective metrology for CMP liquid consumables, and the defect free connection between front-end and back-end, are being demanding but unavoidable challenges for CMP.

 

Organized by

                                                                      

      

 

 

Co-Organized by:


                  

 

 

Executed by:

 

 


 

 

Tentative Agenda


Time

 

Topics / Speakers


08:15-08:35

 

Registration, sign up


08:35-08:40

 

Opening Remarks: Dr. CS Chern, Director of MTC, TSMC,

Chairman of Board Directors of CMPUGTW

 

 

0840‒1020 Session I

Moderator: Dr. LC Kong, Board Supervisor of Innoever Corporation


08:40-09:10

 

1)Nanoparticle Metrology in Semiconductor Manufacturing

Dr. Wei-En Fu, Manager, Center for Measurement Standards, Industrial Technology Research Institute

 

09:10-09:40

 

 

2) Manufacturing of CVD Diamond Wafer

Dr. Thomas Jeng, Sr. Staff, Fongso Technology Corporation
09:40-10:05

 

 

3) TSV CMP Slurry Market and Technology Trend

Dr. Kai Luo, Sr. Product Manager, Anji Microelectronics

10:05-10:20

 

 

4) Overview of CMP Innovation Center at Taiwan Tech

Professor Chao Chung Chen, Distinguished Professor, Director of CMP Innovation Center, Taiwan Tech

10:20-10:40

 

Break


 

1040‒1210 Session II

Moderator: Dr. Charles Lin, Director, Dow Chemical Electronic Materials


10:40-11:10

 

5) Alternative Planarization Technology using Gas Cluster Ion Beam (GCIB) for Advanced Logic Technology

Dr. Yongsik Moon, Principal Member of Technical Staff, Advanced Technology Development, Globalfoundries
11:10-11:40

 

 

6) Micro-replicated Pad Conditioner for Advance Technology Node

Waldo Wang, Technical Service Specialist, 3M


11:40-12:10

 

7) New Innovation Method for FinFET CMP Process Monitor

Ravi Sanapala, Product Applications Manager/KLA-Tencor

 

12:10


 

Adjournment

 

Programs are subject to change without prior notice. 

 

 

 

Forum Fee


Price

 

By 8/23

 

8/24 - 8/31 9/4 Walk-in

 

CMPUGTW board staffs, committees


Free

Free

TWD 200

 

CMPUGTW regular members


TWD 600 TWD 1000 TWD 1200

Non-members

TWD 1000 TWD 1200

 

TWD 1500

 

 

On-line registration: Now till 9/1. After 9/1, only walk-in registration on 9/4.


 

 Price is not included with 5% tax.

Please click here to register

 

 

More infomation please contact                                                    

SEMI Ms. Grace Wang
Tel: 886.3.560.1777 ext.503
Email: gwang@semi.org